About the project

Demcon Focal has the capabilities to design, deliver and qualify one of the most demanding precision optical assemblies: a lithography lens. Demcon is using state-of-the-art alignment tooling and cleanroom facilities to achieve diffraction limited imaging for a large field of view. We have designed a lithography lens with high NA and large field of view that is capable of imaging semiconductor structures on wafers to produce e.g. processors, LEDs, MEMS, USB memory, etc.

Project specifications

  • Magnification 5x (0.2x)
  • Telecentric on image side
  • Field-of-View 22 x 22 mm
  • Diff limited
  • Critical dimensions < 0.4 μm (NA > 0.5)
  • High critical dimensions uniformity (< 2%)
  • Useable Depth-of-Field ~ 1 μm
  • Distortion < 100 nm (maximum over field)
  • Magnification needs to be adjustable using back-focus
  • Order of magnitude 10 ppm
  • Magnification and focus changes due to short term temperature change as small as possible
  • Temperature stability within +/- 0.1 degree Celsius
  • Magnification and focus deviations due to pressure change are compensated using focus and back-focus only
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